Call for Applicants: The Photography Master Retreat 2020, 6th Edition
The Photography Master Retreat 2020, 6th edition – July 4-11, 2020. Applications are due on January 12, 2020
The retreat, launched in 2015, is an annual one-week immersive workshop which takes place in a remote hamlet in the south of France, right after the opening week of Les Rencontres d’Arles nearby.
The Photography Master Retreat:
It is a one-of-a-kind, career-enhancing opportunity for established and emerging photographers to engage in artistic introspection and professional critique. It is not a shooting trip but a rare chance to pause, reflect on your work, get individual input from the mentors and socialize with peers who are also passionate about photography. The retreat is designed for 14 selected photographers who will be selected by the mentors by application. Fresh Provençal cuisine is prepared by our chef-in-residence.
Three internationally acclaimed mentors:
ELISABETH BIONDI – Visuals Editor (1996-2011),The New Yorker, independent curator, writer, jury member, and SVA faculty
LYLE REXER – critic, curator, and SVA faculty
MARTINE FOUGERON – photographer, artist, and ICP faculty
A unique new model of retreat:
It is the only retreat where you are asked to reflect, where the main activity is to look carefully at the work you are making and have made, and to think about what it actually means. What’s good about it, what’s important, and, specifically, what is it that’s yours? What you walk away with is a better sense of yourself as a photographer, and perhaps, a better sense of yourself as a person.
Deadline due: January 12, 2020
Find more information about the retreat here.
