December 13, 2016 - January 10, 2017

©The Photography Master Retreat

THE PHOTOGRAPHY MASTER RETREAT, in its third edition, will be held from July 8 to 15, 2017 for a select group of fourteen participants who will be chosen by the mentors from submitted applications which are due latest by January 10, 2017.  It is designed for professional and aspiring professional photographers - fine art, conceptual, and documentary - who are passionate about their work and want to take it to the next level.

The Photography Master Retreat

Deadline: January 10, 2017

Apply here.